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Silicon Micromachining (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering), by M. Elwenspoek, H. V. Jansen
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This comprehensive book provides an overview of the key techniques used in the fabrication of micron-scale structures in silicon. Recent advances in these techniques have made it possible to create a new generation of microsystem devices, such as microsensors, accelerometers, micropumps, and miniature robots. The authors underpin the discussion of each technique with a brief review of the fundamental physical and chemical principles involved. They pay particular attention to methods such as isotropic and anisotropic wet chemical etching, wafer bonding, reactive ion etching, and surface micromachining. There is a special section on bulk micromachining, and the authors also discuss release mechanisms for movable microstructures. The book is a blend of detailed experimental and theoretical material, and will be of great interest to graduate students and researchers in electrical engineering and materials science whose work involves the study of micro-electromechanical systems (MEMS).
- Sales Rank: #5928356 in Books
- Brand: Brand: Cambridge University Press
- Published on: 2004-08-19
- Original language: English
- Number of items: 1
- Dimensions: 9.96" h x .87" w x 6.97" l, 1.67 pounds
- Binding: Paperback
- 420 pages
- Used Book in Good Condition
Review
'This book has many admirable properties. It covers the chosen subject in considerable detail and brings together much of the state-of-the-art. The illustrations and photographs are of very high quality and indeed the whole book is well presented. It will be useful to both the experienced engineer wishing to sort out a few problems in his own work and to those requiring an introduction to silicon microengineering' R. A. Lawes, Engineering Science and Education Journal
About the Author
Lord Broers is President of the Royal Academy of Engineering and Chairman of the House of Lords Science and Technology Committee. He spent nineteen years in the research and development laboratories of IBM in the USA and then twenty years at Cambridge University as Professor of Electrical Engineering, Master of Churchill College, Head of the Engineering Department, and Vice-Chancellor. In his research at Cambridge and at IBM, he pioneered the use of electron beams to write the patterns for silicon chips.
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